13th International Conference on Atomic Layer Deposition (ALD 2013)

The AVS Topical Conference on Atomic Layer Deposition (ALD 2013) will be a three-day meeting (preceded by one day of tutorials), dedicated to the science and technology of atomic layer controlled deposition of thin films.

ALD 2013 will feature a special focus on Industrialization of ALD, comprising a parallel track of sessions devoted to the technical and strategic challenges involved in moving ALD into products and competitive manufacturing across a wide variety of applications.

Abstract submissions are encouraged in areas such as ALD manufacturability, equipment design, modeling and simulation, sensing and advanced process control, high throughput strategies, and emerging ALD applications to supplement a group of invited talks in these sessions.

For more information: http://www.ald-avs.org/