   | Nanostructure Fabrication2009-07-20 - 2009-07-24MIT Campus | Cambridge, MA MIT Short Course on Nanostructure Fabrication surveys methods of lithography, microscopy, and pattern transfer in the sub-100-nm to sub-10-nm domain for next-generation and beyond-next-generation nanostructure and nanodevice fabrication. Explains fundamental optics and materials science for processing at these lengths scales. Latest relevant research in the area is discussed and practical topics, relevant to in-the-lab work, are presented. WHO SHOULD ATTEND Research scientists from industrial research labs and national labs. Process engineers in the semiconductor industry involved in metrology and/or lithography, or those involved in other process steps, but where knowledge of lithography/metrology may benefit their work. They should be interested in learning more about techniques for next-generation and beyond-next-generation nanostructure fabrication, for example interested in methods of nanostructure prototyping and research. Also, managers and decision-makers interested in a contextual picture of various techniques and technologies for nanostructure fabrication will benefit from the breadth of topics surveyed in the course. Registration Deadline * We recommend applying by June 8th to reserve your place. Learn more about all MIT Professional Education - Short Programs at: http://web.mit.edu/professional/short-programs/index.html For more information: http://web.mit.edu/professional/short-programs/courses/nanostructure_fabrication.html |
MEMS and Nanotechnology Clearinghouse