Dear all
I want to use sputtered silicon nitride for LOCOS process. before
starting my job i wnat to know about the temperature and time for
which sputterd silicon nitride can work as mask without facing any
problem i.e. temerature versus time plot for different sputtered
nitride thickness for LOCOS process. any type of suggetion would
be highly appreciated.
thanx in advance
Prem Pal
Research Scholar