Hi Seh-Won,

   A recipe used in the Berkeley Microlab is used below for an Aluminum
etch.

Pressure      250 mtorr
RF Top        250 watts
BCl3             50 sccm
N2               50 sccm
Cl2               30 sccm
CHCl3           30 sccm

etch rate ~5000-7000 A/min

Phil Tabada



>From: "Seh-Won Ahn" 
>Reply-To: General MEMS discussion 
>To: "General MEMS discussion" 
>Subject: [mems-talk] Aluminium etching
>Date: Mon, 19 May 2003 11:22:11 +0900
>
>
>Hello everyone,
>
>Does anybody have an experience with Aluminium etching for several hundred
>nm-pitch gratings?
>I am using BCl3, Cl2, O2 gases for the etching.  But, PR damage is severe.
>Could you tell me proper etch mask, gas ratios, rf power, etc?
>Thank you in advance.
>
>Sincerely,
>Seh-Won Ahn
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