Hi Madhu
I use 10:1 BOE (Buffered Oxide etch) to etch Titanium, the
etch rate for sputtered Ti is 11kA/min. I use evaporated Ti
& my etch rate is roughly half of that.
I do not have information for Fe & Nickel, but since 10:1
BOE is fairly commonly available in most labs you might want
to determine the etch rates. Overall 10:1 BOE gives me good
& uniform results for Ti etching
Good Luck
Anupama
> I am looking for an etch for Titanium that does not affect
> the following:
>
> 1:Nickel
> 2:Iron
>
> Any help in this regard would be greatly appreciated.
>
> Thanks in advance!
>
> Madhu
> LSU
>
>
>
> Need a new email address that people can remember
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Anupama V. Govindarajan
Graduate Student - EE MEMS laboratory
Department of Electrical Engineering
University of Washington
Campus Box 352500, Seattle WA 98195
Phone: (206)-221-5340
email: [email protected]