Sandhya:
        The bubbles could be the result of poor spin speed up scheme. If you
step
up the spin speed in a way such that the PR spread out along the radius of
the wafer mostly, you won't get bubbles. If the acceleration is too fast,
the PR tend to splash, crash each other then you get bubble.

Hong Wu
Semicoa Semiconductor

-----Original Message-----
From: [email protected]
[mailto:[email protected]]On Behalf Of
sandhya sandhya
Sent: Tuesday, May 27, 2003 3:33 PM
To: [email protected]
Subject: [mems-talk] question regarding photolithography


Hai all,
I am Sandhya,a research student In Boise State University. I have a question
regarding photolithography, I am getting striations and small bubbles in the
resist after spinning and i am using SPR 220.7 resist. Can someone please
kindly say me what might be causing it and what should i do for eliminating
them.
Sincerely
Research student
Sandhya Reddy




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