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MEMSnet Home: MEMS-Talk: Re: Question regarding photolithography
Re: Question regarding photolithography
2003-05-29
madhulika sathe
Re: Question regarding photolithography
madhulika sathe
2003-05-29
Hi Sandhya:

There are a few things you can take care off:

1: Check the optimum speed (try increasing or   decreasing the speed)
2:Pour the resist very slowly and in a concentrated region in the center so that
you avoid any bubbles.
3: Sometimes the resist bottle may have some bubbles trapped inside, make sure
you get rid of them before you pour the resist on the substrate.


Good luck!
Madhu
-------------------------------------------------------
Hai all,
I am Sandhya,a research student In Boise State University. I have
a question regarding photolithography, I am getting striations and
small bubbles in the resist after spinning and i am using SPR 220.7
resist. Can someone please kindly say me what might be causing it
and what should i do for eliminating them.
Sincerely
Research student
Sandhya Reddy





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