Hi,
Does anyone know the (approximate) etch rate of Cu in BHF ?
I am using BHF to remove a copper oxide layer generated on my structures during
processing. I expect the Cu etch rate to be very small, though I would like to
have this confirmed.
The Cu on my wafers have been deposited by means of MOCVD. Perhaps this is
relevant to the question above ?
Thanks,
Frank
__________________
Frank Engel Rasmussen
Industrial PhD Student
MicroElectro-Mechanical Systems (MEMS) Group
Mikroelektronik Centret
Technical University of Denmark
Oersteds Plads, Bldg. 345-east
DK-2800 Kgs. Lyngby, Denmark
Tel. direct: +45 4525 6316
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http://www.mic.dtu.dk
