I want to pattern a composite metal film that is made up of alternating
layers of nickel and aluminum by etching. The thickness of each layer is
approximately 50 nm. Could anyone suggest an etchant that is photoresist
friendly and which would etch the nickel and aluminum at approximately the
same rate? If such an etchant is not available, if I try to etch each
layer individually, is there an nickel etchant which will not etch aluminum,
and an aluminum etchant which will not attack nickel?
Thanks,
Tanya
_______________________
Tanya Snyder, Ph.D.
MicroHouse Technologies
(952) 201-6345
(815) 301 2861 fax
tanya@alum.mit.edu