than you for this information but i already try al etch. the etch rate is
slow with our al etch...

Regards

Thierry Bouchet
----- Original Message -----
From: "Roger Shile" 
To: "General MEMS discussion" 
Sent: Wednesday, September 17, 2003 9:11 PM
Subject: Re: [mems-talk] etching Ni


> Aluminum Etch (phosphoric acid based) is good for etching Ni and won't
> attack Si or SiO2..
>
> Roger Shile
>
> ----- Original Message -----
> From: "thierry.bouchet" 
> To: "General MEMS discussion" 
> Sent: Tuesday, September 16, 2003 9:47 AM
> Subject: [mems-talk] etching Ni
>
>
> > Hello,
> >
> > I would like to etch Ni without etching silicon and SIO2. Is there any
> solution ?
> >
> > Regards
> >
> >
> > Thierry Bouchet
> > R&D engineer
> > IBS
> > Rue gaston Imbert prolongée
> > tel: 04 42 53 89 64
> > fax: 04 42 53 89 59
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>
>
> _______________________________________________
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>