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MEMSnet Home: MEMS-Talk: SU-8 with I-Line-Filter
SU-8 with I-Line-Filter
2003-09-23
pmolter
2003-09-23
Greg Reimann
2003-09-23
Robert Black
2003-09-24
Jacques Jonsmann
SU-8 with I-Line-Filter
Greg Reimann
2003-09-23
Peter,

I have had good results using the filter with SU-8-2025.  There are not
any chemistry differences between SU-8 50 and SU-8 10.  Only the
solvent/resist ratio changes.  Since the filter prevents overexposure
due to stray wavelengths <360nm and you get the same results with and
without it, you may be simply overexposing the sample in general.  I
would try lowering the exposure dose for your thinner resist layers.

Greg Reimann
Boston University
Precision Engineering Research Laboratory

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On Behalf Of
pmolter
Sent: Tuesday, September 23, 2003 4:38 AM
To: [email protected]
Subject: [mems-talk] SU-8 with I-Line-Filter

Hello,
we have problems with processing SU-8-50 and SU-8-10. We are using an
I-Line-Filters to provent negative sidewalls. With SU-8-50 (50µm
thickness) we achieve good results. With SU-8-10 (13µm thickness) we get
the same negative sloped sidewalls as without the filter.

Are there any differences in the chemical composition of the the two
SU-8.

Has anyone experiences with using the I-Line-Filter.

We are searching for help...

Peter Molter
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