power delivered to the wafer chuck (cathode).


Burkhard Volland wrote:

>Hello,
>
>the phrase "platen power" is often used in context of ASE DRIE with ICP
>equipment. As I understand,
>"coil power" or "source power" is the power you feed into the coil to
>maintain the discharge. "Rf power", "cathode power" or "bias power" are
>synonyms for the power you feed into the cathode where the sample is placed,
>in order to create a dc-bias that accelerates (positive) ions towards the
>sample. Is "platen power" a synonym for "cathode power"?
>Best regards,
>Burkhard
>
>
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--

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