you can use 10% H2SO4 - a quick dip does the job

  ----- Original Message -----
  From: Mark Schvartzman
  To: General MEMS discussion
  Sent: Wednesday, January 14, 2004 1:08 PM
  Subject: [mems-talk] Copper oxide stripping


  Hi All.
  Does anybody knows about how we can effectively clean copper pads from its
native oxide by wet stripping? We cannot use no HF based solutions, since we
also have silicon dioxide on the surface that must remain there. Any suggestions
will be welcomed.
  Thank you in advance
  ______________________________________________________________________________
___
  ______________________
  Mark Schvartzman
  Process engineer
  GWS Photonics Inc.
  Paz Towers, 33, Bezalel st.
  Ramat-Gan, 52581, Israel
  Tel. 972-3-7534440
  Cell. 972-58-699748
  E-mail: [email protected]


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