The question from ([email protected] (Robin H. Liu)):

Does anyone know if there is anyway to apply photoresist (e.g., spray)
other than spining? We are currently thinking about how to apply PR
uniformly on a Si wafer which has some 3-D microstructures.

Thanks.

Robin

--

The answer:

There's a photoresist offered by shipley called PEPR 2400. This PR can
be galvanized on the substrate. PEPR 2400 is supposed to be applied on
circuit boards however it works on Si Wafers as well. Setting the Si
Wafer as anode and putting it in the resist bath which includes the
cathodes and a agitation pump.
There's a book called "Chip Stacks for Memory Applications" wrote by
Stefan Linder / Physical Electronics Laboratory ETH Zurich, if you want
to look for more informations.


Noa Schmid