>
> Does anyone know if there is anyway to apply photoresist (e.g., spray)
> other than spining? We are currently thinking about how to apply PR
> uniformly on a Si wafer which has some 3-D microstructures.
>
> Thanks.
>
> Robin
>

I recall from a paper that Shipley offers an eloctro;ytically depositable
resist. Call them and find out.

Alexander Hoelke
University of Cincinnati
Center for Microelectronic Sensors and Microstuctures
Tel: (513)-556-4795

> ****************************************************************
> Robin Hui Liu
> RM B428c, The Beckman Institute,           | Tel: (217)-333-0188 (o)
> University of Illinois, Urbana/Champaign  |      (217)-359-0051 (H)/fax
> 405 N.Mathews Ave.                                | Fax: (217)-244-0105
> Urbana, IL 61801                                     |
> ****************************************************************
> Email: [email protected]
>
>
>
>
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>