Hello friends

I have a simple question. I want to deposition/pattern
of Al metal 1, layer of thickness 1.5um on si
substrate, Deposition/pattern of polymide (A type of
polymer used as a sacrificial layer with Al ) of 1um
thickness and
Deposition/pattern of metal 2 layer of thickness
1.5um.

I want to get final structure if polymide layer is
entirely removed after patterning of metal 2. I know
this is very simple question. but i am a new learner
in this MEMS area. I would appriciate if someone
describe me entire process step by step by using
photolithography. The first metal mask is light field
mask (design of polygon, square and three circle)
second polymide mask is dark field (design of two
small square and three circle) and third metal mask is
light field (design of ractangle, triangle,  two
circle and plus sign).



wirh regards
piyush



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