>   10. What could be wafer surface temperature during sputter
 >       deposition w/ Al deposition, 10000W, 150sccm Ar flow,  12min
 >       deposition time? (Cheol Han)

The wafer surface is where vapour phase Al condenses to the solid state,
so as an estimate you can use the boiling point of Al.

If what you really mean is the substrate temperature, without active heat
sinking (backside gas), a 2µm Al deposition in 1.5 min. has been measured
to heat a standard wafer from room temp. to over 550 C.

best regards,
klaus

--
Klaus Beschorner
Metron Technology Europe, PVD (Eclipse) Process Manager
Drosselweg 6,71120 Grafenau,Germany. Tel +49-7033-45683