Hello,



I have a couple of questions about LPCVD processing of low stress silicon
nitride.

*       I am searching for some processing parameters for making thinn
(<1µm) low stress silicon nitride membranes with the use of a LPCVD. We are
about to set-up an LPCVD at our facility but I am in short supply of decent
parameters to start out with. Is there someone who could help me?
*       Is it possible to make a low stress silicon nitride with silane
(SiH4) instead of dichlorsilane (SiCl2H2) gas?



Thanks



Marcus Törndahl



_____________________________________________

Marcus Törndahl (PhD student, MScEE)

Department of Electrical Measurements/LTH

Lund University

Ole Römers väg 3

SE-221 00 Lund

Sweden