Hi Qing Yao
I have good experience in dry etching of Si3N4. We do it using CHF3, CF4
and O2 mixture.
greetings
Stefan

-----Original Message-----
From: [email protected]
[mailto:[email protected]] On
Behalf Of Qing Yao
Sent: Donnerstag, 1. April 2004 18:43
To: MEMS-talk
Subject: [mems-talk] how to remove Silicon Nitride


Hi,


I was wondering if H3PO4 (at between 160 to 180 degrees centigrade) can
remove Silicon Nitride without attacking Silicon Dioxide. Are there any
other methods I could use?


Best Regards,


Qing Yao
___________________
M&IE @ UIUC


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