hello tomi,

what power are you using? is it RF or DC?
One possible reason I can think of is
contamination/oxidation of your aluminum target
thereby signficantly reducing your rate of sputtering.
Try burning in your target for a few minutes with
incremental power and try again.
Also if there is any leak in your sputter machine, it
will adversely effect your sputtering.

regards,
adnan merhaba


--- Tomi Meilahti  wrote:
> Hi everybody,
> We recently purchased an aluminium target for the
> companys rather old Leybold-Heraeus (model Z 400 I
> think) sputtering system. The problem is I can´t
> find working sputtering parameters for it. Either
> there is no aluminium coating on the test wafer at
> all or then the coating is of very dark colour. The
> process looks OK when I look through the small
> windows on the chamber walls. I´ve tried varying
> sputtering pressure and voltage. Any ideas or
> suggestions would be greatly appreciated.
> Best regards
> Tomi Meilahti
> Metorex International Oy
> Nihtisillankuja 5
> 02631 Espoo
> Puh: 09 32941316
> Fax: 09 32941301
> E-mail: [email protected]
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