It works. Hot phosphoric acid is very selective.
Do a literature search or a Web search for data.
    --Kirt Williams

----- Original Message -----
From: "Y.C. Lin" 
To: 
Sent: Sunday, April 04, 2004 8:12 PM
Subject: [mems-talk] Strip Silicon Nitride


> Dear all:
>
> I would like to use phosphoric acid at 185 centigrades to strip the
nitride
> layer which is on my polysilicon layer.
> Does anyone know how the selectivity of the phosphoric acid between
nitride
> and polysilicon?
> What are the respective etching rate?
> I hope that the phosphoric acid can remove the nitride without damaging
the
> polysilicon.
> Does this method work (phosphoric acid, 185 centigrades)?
>
> Please give me some advice.
> Thank you very much!
>
> Regards,
>
> Y.C. Lin
> +886939682120
> Dept. of Power Mechanical Engineering, National Tsing Hua University,
> Taiwan.
>
>
>
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