mailing list submission


Hello to all


I want to deposit TiO2/anatase coating by Low
pressure CVD, at low temperature (100°C).
Precursor used Tetra Iso Propyl Ortho Titanat
and Tetra Ethyl Ortho Titanat.
Generally, over glass and metals, I only get
amorphous coatings, that need to be heat-
treated at 600°C to crystalise in anatase.
Eventually, same depositions on monocristaline
wafers have a certain degree of crystalinity.

So my question is how to get directly crystalic
coatings by CVD  at same temperature:

Underlayer? different precursor?
any comments or suggestion deeply welcomed




                             Harry Nizard


-----------------------------------
 EADS Deutschland GmbH
 Corporate Research Center Germany
 IRT/LG-SC (Surfaces & Chem. Eng.)
 Tel No.: +49-(0)89-607-20748
 Fax No.: +49-(0)89-607-25408
 mailto:[email protected]
-----------------------------------