Dear Suitto,

I have tried this succesfully (only at 395 nm).
>From the absorbance diagram in the SU-8 datasheet, you can calculate the
required exposure dose.
You will find that the exposure dose is indeed very high! I estimate that you
will need 250 times the exposure dose listed  in the SU-8 datasheet (for 365
nm). Your total exposure times will be measured in weeks rather than in hours!
My conclusion was that it is both faster and cheaper to order a photomask and do
traditional photolithography.

Jacques Jonsmann




________________________________

From: [email protected] on behalf of suitto kk
Sent: Mon 12/04/2004 12:44
To: [email protected]
Subject: [mems-talk] SU-8 recording at 400nm



Dear Mems-talk,
I would like to ask if anyone have experiences with
recording using laser lithography at 400nm? Although the
SU-8 specs says absorbance starts below 370nm, we found
that the recorded structures become a featureless mass
after PEB and development. Would be great if someone can
offer some insight. Thanks for reading.

suitto


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