I did some work on the maximum strain that can withstand SiGe layers for optical application. You can find some of it in: Appl. Phys. Lett. 75, 2232 (1999) and check the references there. Hope it helps. Diego Krapf ----- Original Message ----- From: "bearren111111111" To: Sent: Tuesday, April 27, 2004 2:10 PM Subject: [mems-talk] please help me about mems!!! > I am a student of China,I want to known the maximum strain of epitaxy silicon film .It is so important to me,so if you can please help me! > ______________________________________ > > > ×¢²áÐÂÀË9Õ×Ãâ·ÑÓÊÏ䣨 http://mail.sina.com.cn/chooseMode.html £© > > =================================================================== > ×ϹâɨÃèÒÇ´º¼¾·ç±©£¬MP3¡¢ÉãÏñÍ·¾ªÏ²ÉÏÊÐ (http://ad4.sina.com.cn/shc/zhuiyu_hprefresh1.html) > > >