Can anyone suggest a robust, thick resist (up to 20 um) UV/hot plate cure
process for AZ9260 or AZ4620 used as a mask in a DRIE Bosch process?  Our
standard process uses either a hot plat or oven, and we would like to find a
process that would maintain better resist sidewall profiles, as well as
increase the selectivity of the mask to silicon.  We are planning to run
some tests using a Fusion M150-PC.


Eric Miller
[email protected]
Ph:  206 616-3855
www.watechcenter.org