Lee,

You can us HF to remove native oxide instantly from your Si but it grows
right back in seconds.  If you need to have an oxide free surface before
depositing a film you must sputter etch your sample inside the vacuum
chamber.

Brent

"Lee, Duhyun" wrote:

> Dear MEMS Talkers,
>
> I'm trying to remove the native oxide on Si (111) surface and
> to sputter a metal on the bare (111) surface.
> To my knowledge, BOE seems to be suitable but I have no experience on it.
>
> Please show me your recipe to get a fresh Si(111) surface for sputtering.
>
> Lee, Duhyun
>
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