I would place it horizontally. If there is a temperature gradient in
your etch the silicon will etch non-uniformly. However, since the etch
practically stops once your grooves are formed, that may not matter for
your process.

-Jeff Campbell

Dhanamjaya Guda wrote:

>Hi,
>
>  I am  trying to produce v-groove on Si using KOH. Could any one please tell
me how to place the Si wafer (either verical or horizontal i.e just
>dropping the wafer in the solution) in the KOH solution and also could you
please give me particular reasons for choosing the one. I would really
appreciate if any one could reply to this mail as soon as possible.
>
>Thanks,
>Dhanamjaya R Guda
>Louisiana State University
>Baton Rouge -LA
>Phone no: 225-578-4412
>
>
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