Hello Bill
            First of all thank you very much for your prompt reply. Really
appreciate it. Could you pls write in detailed steps about
the process flow so that I can try it ( for ex > spinning speed and baking time
and temp . , exposure time details.).Also do you
use LOR 20 B . Do you think it is possible to get 2 um Cu lift off  on 5 um
features using LOR 20 B and Sphipley 1813 PR
..The substrate I use is polycrystalline alumina .Please let me know ,
           Thank you very much,
                    Sincerely,
                             Dipankar Ghosh


----- Original Message -----
From: "Bill Moffat" 
Date: Tue, 28 Sep 2004 09:07:50 -0700
To: "General MEMS discussion" 
Subject: RE: [mems-talk] Metal Lift off using LOR 20 B and Shipley 1813

> Dipankar,
>          I will try to reach you directly.  The MEMS reply format does not
lend itself to long explanations.  Short answer think 1.2
micron thick resist and 0.1 micron features.  With 5 microns of resist 0.5
microns should be easy.  Bill Moffat
>
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