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MEMSnet Home: MEMS-Talk: how to spincoat a 50nm thin uniform film of AZ9260?
how to spincoat a 50nm thin uniform film of AZ9260?
2004-10-18
Z. Jiang
2004-10-18
Isaac Wing Tak Chan
2004-10-18
Isaac Wing Tak Chan
2004-10-18
Borski, Justin
2004-10-19
Z. Jiang
2004-10-20
narges afshari
2004-10-19
Z. Jiang
2004-10-19
Isaac Wing Tak Chan
how to spincoat a 50nm thin uniform film of AZ9260?
Isaac Wing Tak Chan
2004-10-18
Jiang,

Is there a particular reason that you need to use AZ9260? Can you use a
less viscous photoresist like AZ3312? 50nm is really thin. Even AZ3312 is
still in the range of 500nm. Why don't you contact Clariant Corp. for
choosing the right product for you. Check out www.clariant.com for
customer service number.


Yours sincerely,

Isaac Chan

Ph.D. Candidate
Dept. Electrical & Computer Engineering
University of Waterloo
200 University Ave. W
Waterloo, Ontario, Canada
N2L 3G1
Tel: (519) 888-4567, ext. 6014
Fax: (519) 746-6321
[email protected]
http://www.ece.uwaterloo.ca/~a-sidic


On Mon, 18 Oct 2004, Z. Jiang wrote:

> hi,
>
>    I need to spin-coat a layer of very thin (~50nm) AZ9260 photoresist.
> Normally AZ9260 is for thickness range 4um to 25um. By adding AZEBR thinner
> to a certain ratio (from 1:5 to 1:50), it can be diluted and spin-coated to
> sub-micron thickness. However, the film formed by the diluted solution will
> always contain some big black polymer beads which seriously harm the
> quality of the film. Does anyone have similar experience and can tell a
> little bit information on how to avoid this problem? Thanks a lot.
>
>    Jiang
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