Hi all,

I am currently using AZ5214e photo resist (as negative resist, 3um thick) to
protect structures from HF vapor. Unfortunately the HF diffuses trough the
resist film and etches the "protected" SiO2.

Does anyone have experience with (or know) a negative photo resist wich can
be used to protect SiO2 against HF vapor?

Thanks,

Carsten

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Carsten Dehoff
Institut für Werkstoffer der Elektrotechnik, RWTH Aachen
Sommerfeldstrasse 24
52074 Aachen
Germany