Jiang,

The MJB4 aligner was configured with different lamps and filters. The output
power and wavelength - near UV, deep UV etc. varies from machine to machine.
What you really need is a UV light meter to measure the output at the
wavelength of interest.  My guess is that one should exist in your facility
as it is needed to set-up the aligner after a bulb chance but if not one can
be purchased from many sources including our company OAI.

See our web site  or contact me for details.

Regards,
---Paul Maciel
   Optical Associates Incorporated
   (408) 232-0600 x211

> -----Original Message-----
> From: Kirkness Jeoffrey [mailto:[email protected]]
> Sent: Friday, December 03, 2004 6:30 AM
> To: [email protected]
> Subject: [mems-talk] MJB4 mask aligner lamp power and PMMA UV exposure
>
>
> hello all,
>
>    I am using MJB4 mask aligner doing photolithography. The technical
> part of the manual didn't tell the lamp power for exposure. I need to
> know how much mw/cm2 it will provide so that I can compare with the
> exposure dose of photoresists in mj/cm2. I can't find anything on the
> web. Can anyone give any advice? Thanks
>
>    By the way, I also want to know whether we can expose PMMA under UV
> light instead of normal Ebeam exposure? I have tested under my mask
> aligner to expose 150nm 950PMMA for 20sec, but after I put it in 1:3
> MIBK:IPA solution for 1min, nothing happened. I saw in my technical
> reference that the exposure dose of PMMA is around 500mj/cm2, which is
> similiar to the AZ9260 I have been dealing with, and so I applied a
> similar exposure time. I dont' understand why it is not developed.
>
>   cheers
>
>   Jiang
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