Dear Jiang,

I think I can shed some light here. The dosage you mention would be
approximately correct (somewhat  low) if you were measuring at DUV. PMMA is not
responsive to wavelengths much above 250 nm. In fact, it begins to respond at
250nm, has an odd peak in the 215 - 220 nm range then falls off again.

Very Best Regards,
Rob Hardman
Technical Sales Representative
MicroChem Corp.
617-965-5511 ext. 313
[email protected]

www.microchem.com 






Message: 10

Date: Fri, 3 Dec 2004 14:29:34 +0000

From: Kirkness Jeoffrey 

Subject: [mems-talk] MJB4 mask aligner lamp power and PMMA UV exposure

To: [email protected]

Message-ID: 

Content-Type: text/plain; charset=US-ASCII

hello all,

I am using MJB4 mask aligner doing photolithography. The technical

part of the manual didn't tell the lamp power for exposure. I need to

know how much mw/cm2 it will provide so that I can compare with the

exposure dose of photoresists in mj/cm2. I can't find anything on the

web. Can anyone give any advice? Thanks

By the way, I also want to know whether we can expose PMMA under UV

light instead of normal Ebeam exposure? I have tested under my mask

aligner to expose 150nm 950PMMA for 20sec, but after I put it in 1:3

MIBK:IPA solution for 1min, nothing happened. I saw in my technical

reference that the exposure dose of PMMA is around 500mj/cm2, which is

similiar to the AZ9260 I have been dealing with, and so I applied a

similar exposure time. I dont' understand why it is not developed.

cheers

Jiang