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-----Original Message-----
From: su mems [mailto:[email protected]]
Sent: Tuesday, December 07, 2004 9:01 PM
To: [email protected]
Subject: [mems-talk] Request for papers


Hi,
Sorry to file this request but does anyone happen to have
a soft copy of the following 2 papers? Thanks in advance.

N. LaBianca, and J. Delorme, "High aspect ratio resist for thick film
applications", in Proc. SPIE vol. 2438, SPIE,
(1995) : 846-852 : the first (?) attempt to use thick
layer of SU-8. By the IBM team.
N. LaBianca, J. Gelorme, K. Lee, E. Sullivan,and J. Shaw,
"High aspect ratio optical resist chemistry for MEMS applications", in Proc.
4th Int. Symp. on Magnetic Materials, Processes, and Devices, The
Electrochem. Soc., 95-18 (1995), pp.386-396


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