I've noticed that an ultrasonic acetone bath is too vigourous for my
particular metallic liftoff process with AZ5214E (1.4-micron thick) in
the case of a thin sputtered aluminum film (1000-A thick). Oftentimes,
the 10-micron wide patterned Al features also liftoff from the
substrate. I would like to know if anyone has experience with using
acetone at elevated temperature during liftoff (with the acetone beaker
immersed in a 37 degree C water bath)? Thank you.


Thomas E WILSON, Ph.D.
Professor of Physics and Physical Sciences
Marshall University
One John Marshall Drive
Huntington, WV  25755-2570
Tel: (304) 696-2752
FAX: (304) 696-3243