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MEMSnet Home: MEMS-Talk: Unstable Plasma - Dry Etching
Unstable Plasma - Dry Etching
2005-01-20
William Lanford-Crick
2005-01-20
Isaac Wing Tak Chan
2005-01-21
William Lanford-Crick
2005-01-21
Robert Lindegren
2005-01-21
Frank Torregrosa
HfO2 removal
2005-01-25
[email protected]
2005-01-20
[email protected]
2005-01-21
Capps, Scott
2005-01-25
Blunier, Stefan
Unstable Plasma - Dry Etching
Robert Lindegren
2005-01-21
Hi Bill.

We have the same problem here at Uppsala University with our RIE. The
problem started a few weeks ago with a flickering plasma. We could run
the RIE for some minute with this flickering plasma and then is seams to
change to a mode with a dark UV color. The reflected power where till
zero. We change the chamber manometer and the problem disappeared for
two week. Now we seem to have the same situation again. It has come to
our knowledge the some one has etched silicon with diamante as a stop
membrane just before the times that this problem has occurred. Maybe the
carbon contaminates the chamber or the manometer. All manometers and
flow meters are calibrated. The plasma seems to be little more stable if
we lower the pressure.

If you or anyone else comes up with idea, please let me know.


-------------------------------------
Robert Lindegren,  M.Sc.
The Ångström Space Technology Centre

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