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MEMSnet Home: MEMS-Talk: Unstable Plasma - Dry Etching
Unstable Plasma - Dry Etching
2005-01-20
William Lanford-Crick
2005-01-20
Isaac Wing Tak Chan
2005-01-21
William Lanford-Crick
2005-01-21
Robert Lindegren
2005-01-21
Frank Torregrosa
HfO2 removal
2005-01-25
[email protected]
2005-01-20
[email protected]
2005-01-21
Capps, Scott
2005-01-25
Blunier, Stefan
Unstable Plasma - Dry Etching
William Lanford-Crick
2005-01-21
Hi,
Shortly after sending this email, the ICP coil power no longer matches at
all.  100% reflected power, no matter what the setting of the matching
network are.  We are investigating the matching network as well as the power
supply itself....perhaps it a related problem.

Thanks for your suggestions,
Bill

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