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MEMSnet Home: MEMS-Talk: AL masking
AL masking
2005-02-02
Daniel Lloyd
2005-02-03
Kirt Williams
2005-02-02
[email protected]
AL masking
[email protected]
2005-02-02
Daniel:

No you cannot etch Al with Fluorine containing gases. Also, as a masking
material it can present some problems like micromasking when pieces of the Al
fall onto your pattern to be etched. I would suggest Ni or Cr as an alternative.
Bob Henderson

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