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MEMSnet Home: MEMS-Talk: Some Questions About Material Efficiency In Sputtering And E-Beam Evalporation
Some Questions About Material Efficiency In Sputtering And E-Beam Evalporation
2005-02-06
Abbas Abbaspour-Tamijani
Some Questions About Material Efficiency In Sputtering And E-Beam Evalporation
Abbas Abbaspour-Tamijani
2005-02-06
I am writing a proposal and need to get an estimate of how much gold we need to
buy for our process. Does anybody know answer to some of these questions:

1- Do you think a 2" sputtering targets give good enough uniformity for a 3"
wafer, or we will have to resort to 3" or 4" targets?

2- How can we get a rough estimate of how many 0.5um sputtering runs are
possible out of a 4"X1/8" gold target (nearly 25cc or 466g)?

3- How about efficiency of e-beam evaporation, how can I calculate the amount of
gold that is consumed to deposit a film of 0.5 um thickness?

Thanks for your help.
reply
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