Hi all,

Some questions on Si3N4 wet etch
- H3PO4 :H20, what is a good ratio and temp (160?).
- would static immersion of wafer in a quartz container with H3PO4 work or
do we need a special circulating tank.
- would it still work for GaAs substrates.
- does H3PO4 attack PR's (AZ 5214).

thank,
krishna