How to do the lift off process after aluminumdepo
sition? It is negative resist.
Steven McMaster
2005-04-01
Using a bi layer resist process gives excellent results. For example
Microchems LOR series of resists, then spinning imaging resist on to of that
gives an undercut which aids the solvent in removing both resists, and hence
the metal film. This LOR resist should be 1.3 times the film thickness you
want to lift off.
Regards,
Steven.
