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MEMSnet Home: MEMS-Talk: Problem in photolithography
Problem in photolithography
2005-04-01
[email protected]
2005-04-01
Kamat Mahesh Keshav
2005-04-01
Haroon Lais
2005-04-01
Brubaker Chad
2005-04-02
Mahesh Pitchumani
Problem in photolithography
[email protected]
2005-04-01
my spin speed is 4000rpm with a ramp of 30000r/s, and the prebake temperature is
100 degree c with a time of 1 minute, but there is always some photoresist
remained no matter how long the develop time, why? Is the pre bake temperature
too high and the the photoresist been destroyed?



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