1.
I have been coating PEPR 2400 ED on Ti-coated Si wafers. the Si wafers
have anisotropically etched pits (~200 um). Post-exposure development (in
0.2 NaOH) leads to removal of alot of resist-patterns. I have tried it at
different temperatures the result is the same.

2.
What is the best stripper for the PEPR 2400 ? I have tried 0.2/0.3 NaOH (@
30-60 degrees celsius) and Acetone. they all leave a very mild, but
visible brown layer.


Thanks,
Vinit