SiH4 and O2 certainly will explode if the concentrations are
sufficiently high.  For APCVD SiH4 and O2 both diluted with N2 are
commonly used.  For LPCVD a less reactive oxidizer, such as N2O is
usually preferred.  If the reactor is a tube furnace, injector tubes and
caged boats are used for the so-called "LTO" process to overcome
reactant depletion.

Roger Shile

-----Original Message-----
From: Liu X.F.
Subject: [mems-talk] deposite SiO2

i plan to deposite SiO2 by LPCVD employing SiH4 and O2 as
precursors,but i wonder whether the mixture of SiH4 and O2 will explode
at high temperature?
SiH4+2O2---SiO2+2H2O   (1)
SiH4+O2---SiO2+2H2     (2)

Thanks

anodle