I have used CF4/O2 plasma (30sccm/10sccm), 100W and have gotten an etch
rate of 2.4 um/hr. Ofcourse it was just ~2000 A of Ti. If this doesn't
work, you could try using CF4 as Steven has suggested.

Jey Subbaroyan
Ph.D. Candidate
Neural Engineering Laboratory
University of Michigan, Ann Arbor
http://nelab.engin.umich.edu

-----Original Message-----
From: [email protected] [mailto:[email protected]]
Subject: [mems-talk] Ti Dry Etch

I am looking for a dry etch recipe for ~1800 A of Ti with the native oxide
as the top layer.