Nik:

Try using LPCVD nitride instead. It is easy to mask and etch and has very high
selectivity to KOH etchants. Bob Henderson

-----Original Message-----
From: Nik Dee 
Subject: [mems-talk] Chrome mask for silicon etching in KOH

I am using a 100-150 um Chrome mask to etch <100> silicon in KOH under
80 C. After 12-15 minutes the Chrome mask layer seems to be attacked by the
solution. Any ideas how i can possibly overcome this problem.