Hello every body,

Could anyone tell me if it would be possible to deposit oxynitride films in a
PECVD reactor, knowing that the only gaz lines connected to the machine are NH3,
Mixture of CF4/O2, O2, N2 and TEOS (bubbler). I din't manage to find any
articles about it ?

If anyone could help me I woul be very grateful !

Yours sincerely