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MEMSnet Home: MEMS-Talk: Photoresist for Lift-off process
Photoresist for Lift-off process
2005-08-02
Richard Chang
2005-08-03
Bill Moffat
2005-08-05
Brubaker Chad
2005-08-08
Huy Vo
KOH Wet Etching of Si wafers
2005-08-09
Daniel Park
2005-08-10
Shay Kaplan
2005-08-12
Christian Schröder
2005-08-12
Josef Kouba
2005-08-09
Wilson, Thomas
2005-08-11
Boyd Evans
Photoresist for Lift-off process
Richard Chang
2005-08-02
Hi, All,

  Does anybody know what the photoresist are for lift-off process other than
Futurrex NR7-1500PY?
  I need to use lift-off process to pattern the sputtering silicon dioixde
layer. But I don't have NR7-1500 PY.
  Could I use two different photoresists, just normal positive photoresists, to
do the lift-off? I have S1813, AZP 4620, and AZP 4210.
  Is there guidance I should follow?
  Thanks.

Richard Chang
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