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MEMSnet Home: MEMS-Talk: Lift-Off-Process question
Lift-Off-Process question
2005-08-10
Sven Passinger
2005-08-10
Jesse D Fowler
2005-08-10
Cristi Lepadatu
2005-08-11
Sven Passinger
2005-08-11
William Lanford-Crick
eutectic point of silicon-aluminum
2005-08-11
li cai
2005-08-12
Felix Lu
2005-08-11
Guillermo Villanueva
2005-08-11
Sven Passinger
2005-08-11
[email protected]
Lift-Off-Process question
Sven Passinger
2005-08-11
I can clearly see the undercut in the SEM pictures and structures of
below 500nm as I want.

The question I have to evaporating: you need high temperatures for this.
Is this no problem for the resist? I think the S1800 series begins to
flow above 100°C. As far as I know eveparoting of gold means much higher
temperatures.

Regards
Sven

> -----Ursprüngliche Nachricht-----
> Von: Cristi Lepadatu
> Gesendet: Mittwoch, 10. August 2005 22:00
> An: General MEMS discussion
> Betreff: Re: [mems-talk] Lift-Off-Process question
>
> As Jesse says, you have to evaporate. Sputtering will not
> give you the desired results. You may also check the resist
> profile in SEM and see if it is suitable for lift off (a
> small undercut after development is desirable).
reply
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