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MEMSnet Home: MEMS-Talk: Problems with lift-off using S1813 photoresist
Problems with lift-off using S1813 photoresist
2005-08-23
ahajjiah
2005-08-23
William Lanford-Crick
2005-08-23
Steven McMaster
2005-08-23
William Lanford-Crick
2005-08-23
Bill Moffat
2005-08-23
Wilson, Thomas
2005-08-23
schahrazede mouaziz
2005-08-24
ANIRBAN CHAKRABORTY
Problems with lift-off using S1813 photoresist
William Lanford-Crick
2005-08-23
Hello,
I have not tried the method that you suggest.  However, the vendor of the
S1813 photoresist (I believe it is Microchem?) does also sell a developer
which they claim will not attack aluminum.  If you cannot get the single
S1813 resist film to work, you could try calling Microchem and asking one of
there technical support people about it.
Good Luck,
Bill
-----Original Message-----
From: ahajjiah
Subject: [mems-talk] Problems with lift-off using S1813 photoresist

Dear All,

I am having a lot of problems using S1813 photoresist for my lift-off. It
was
recommended to me in the past to use S1813 with LOR3A or LOR5A to help me
solve my lift-off problem. unfortunately, by using the bi-layer photoresist
system my lift off problem was solved but the developer, the AZ400K
developer,
i used to do the lift off was etching my Al metal.

reply
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