A MEMS Clearinghouse® and information portal
for the MEMS and Nanotechnology community
RegisterSign-In
MEMSnet Home About Us What is MEMS? Beginner's Guide Discussion Groups Advertise Here
News
MEMSnet Home: MEMS-Talk: Problems with lift-off using S1813 photoresist
Problems with lift-off using S1813 photoresist
2005-08-23
ahajjiah
2005-08-23
William Lanford-Crick
2005-08-23
Steven McMaster
2005-08-23
William Lanford-Crick
2005-08-23
Bill Moffat
2005-08-23
Wilson, Thomas
2005-08-23
schahrazede mouaziz
2005-08-24
ANIRBAN CHAKRABORTY
Problems with lift-off using S1813 photoresist
Bill Moffat
2005-08-23
Steve/ahajjiah,
              A guaranteed simple lift off process using any positive
photo resist dimensions of below 0.1 micron rock solid production
process with no painful variables and side walls with a 22 degree
overhang.  Let me know if you want to run free tests and get technical
papers on the process.  We have also run resists as thick as 40 microns
for copper plating up in this case vertical side walls.


Bill Moffat, CEO
Yield Engineering Systems, Inc.
2185 Oakland Rd., San Jose, CA  95131
(408) 954-8353

reply
Events
Glossary
Materials
Links
MEMS-talk
Terms of Use | Contact Us | Search
MEMS Exchange
MEMS Industry Group
Coventor
Harrick Plasma
Tanner EDA
Harrick Plasma, Inc.
University Wafer
The Branford Group
Process Variations in Microsystems Manufacturing